Apparatus for vapor deposition of a film on a substrate
US4446817A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Dec 14, 1981 |
| Grant date | May 8, 1984 |
| Priority date | — |
| Expiry date | Dec 14, 2001 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B25/105
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Substrates on which vapor deposition is to take place are mounted on the outside of a generally bell-shaped susceptor which is itself mounted immediately outside a similarly shaped shield which is transparent to infra-red radiation. Infra-red lamps are mounted within the shield and the radiant heat from them passes through the shield and heats the substrates through the susceptor. An outer, opaque, shield defines an annular gas passage through which reactant gases pass over the heated substrate to cause vapor deposition thereon. Purging gas may be passed between the transparent shield and the susceptor. The lamps and the susceptor may be relatively rotated. The arrangement substantially eliminates the possibility of the reactant gas causing deposition on the transparent shield which would interfere with the passage of radiant heat to the susceptor and the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.