Plasma electron source for cold-cathode discharge device or the like
US4458180A · kind A · utility
34Cited by
4References
35Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 18, 1982 |
| Grant date | Jul 3, 1984 |
| Priority date | — |
| Expiry date | Feb 18, 2002 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32009
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma electron source has an apertured cathode, and a housing for defining a cavity behind the aperture. A trigger electrode, in communication with the cavity, is responsive to a short-duration trigger pulse for establishing plasma in the cavity. The plasma is sustained in the cavity subsequent to the termination of the trigger pulse by a bias circuit, which biases the cavity at a relatively low voltage with respect to the cathode for a period of time much longer than the duration of the trigger pulse.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.