Low reflectance, low emissivity sputtered film
US4462884A · kind A · utility
39Cited by
6References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 25, 1983 |
| Grant date | Jul 31, 1984 |
| Priority date | — |
| Expiry date | Jul 25, 2003 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/12597
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method is disclosed for producing by cathode sputtering a silver/copper coated article which duplicates the low reflectance colored appearance of a silver/copper coated article produced by wet chemical deposition. The method involves depositing the silver layer in a discontinuous agglomerated state.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.