Photosensitive polymer compositions comprising polyether-ester amides
US4464456A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 3, 1983 |
| Grant date | Aug 7, 1984 |
| Priority date | — |
| Expiry date | Jan 3, 2003 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/107
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A photosensitive polymer composition containing 0.01% to 10% by weight of a photosensitizer and, the following components A and B, is presented. PA0 A. 100 parts by weight of polyether-ester amide comprising (a) at least one compound selected from the group consisting of aminocarboxylic acids having 6 to 15 carbon atoms, lactams having 6 to 15 carbon atoms and nylon mn salts wherein 10.ltoreq.m+n.ltoreq.30, (b) at least one poly(alkylene oxide) glycol having a number average molecular weight of 200 to 6000, and (c) at least one dicarboxylic acid having 4 to 20 carbon atoms; and PA0 B. 10 to 200 parts by weight of at least one photopolymerizable vinyl monomer having a terminal ethylenically unsaturated bond and having a boiling point of at least 150.degree. C. This photosensitive polymer composition is extremely effective for use in a photosensitive flexographic printing plate developable in water or in alcohol.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.