Silver halide photographic light-sensitive material
US4464462A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 29, 1983 |
| Grant date | Aug 7, 1984 |
| Priority date | — |
| Expiry date | Jul 29, 2003 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/162
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A silver halide photographic light-sensitive material having improved antistatic properties is disclosed. The material is comprised of a support having thereon a light-senstive silver halide emulsion layer and a light-insensitive layer. The material includes (A) a flourine containing cationic surface active agent and (B) an ultraviolet ray absorbing polymer latex which comprises a polymer or a copolymer having a repeating unit derived from a monomer represented by the following general formula (I): ##STR1## within the formula (I) the Q is an ultraviolet ray absorbing group represented by the following general formula (II) or (III): ##STR2## the substituents within the formulae shown are defined within the specification. The ultraviolet ray absorbing polymer latex is present in the material in an amount in the range of 10 to 2,000 mg/m.sup.2 of the material. The material which contains a combination of the ultraviolet ray absorbing polymer latex and the fluorine containing cationic surface active agent has excellent antistatic properties and does not result in the occurrence of pressure marks.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.