Plasma deposition apparatus for photoconductive drums
US4466380A · kind A · utility
33Cited by
6References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 10, 1983 |
| Grant date | Aug 21, 1984 |
| Priority date | — |
| Expiry date | Jan 10, 2003 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S118/90
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
This invention is directed to an apparatus for preparing semiconducting and photoelectronic devices comprised of a first electrode means, a second counter electrode means, a receptacle means for the first electrode means and the second counter electrode means, a substrate means to be coated contained on the first electrode means, which substrate is in the form of a cylindrical member, and a gas inlet means, a gas exhaust means, wherein a silane gas is introduced into the receptacle in a crossflow direction, perpendicular to the axis of the cylindrical member.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.