Method for making a silicon dioxide coating
US4468420A · kind A · utility
39Cited by
1References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 3, 1983 |
| Grant date | Aug 28, 1984 |
| Priority date | — |
| Expiry date | Oct 3, 2003 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2218/111
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method for making a silicon dioxide coating on a surface of a substrate such as, for example, an alkali metal-containing glass sheet by dipping the substrate in a treatment liquid obtained by adding boric acid to an aqueous silicon dioxide-saturated solution of hydrosilicofluoric acid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.