Patent · US Expired

Method of making pattern matrix having uniform backer thickness

US4474720A · kind A · utility

2Cited by
7References
7Claims
0Family size

Assignee

Inventor

Key dates

Filing dateJan 31, 1983
Grant dateOct 2, 1984
Priority date
Expiry dateJan 31, 2003

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/24273
  • WIPO fieldOther special machines
  • WIPO sectorMechanical engineering

Abstract

A tough, flexible, sheet-like matrix for a bas-relief pattern is made by casting a reinforced resin on a mold of the pattern and submerging a perforated plate in the liquid resin so that the plate is parallel to a substantially flat plane generated by the lowest points of the pattern. The matrix, exclusive of the peaks and valleys of the pattern, has a uniform thickness and has a multitude of studs integral with and dependent from the sheet. A porous matrix is useful for the wet-end texturing of fiberboard at the final suction press roll of a Fourdrinier fiberboard machine.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.