Method and apparatus for material analysis
US4476386A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 26, 1982 |
| Grant date | Oct 9, 1984 |
| Priority date | — |
| Expiry date | Jan 26, 2002 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/24495
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Method and apparatus for material analysis in which X-rays generated pursuant to incidence of an electron beam on the material are detected by a detector which generates signals representative of X-ray intensity. A first single analyzer is connected to receive the signals from the detector and to pass to an associated first counter a count signal whenever the signal applied to the first single channel analyzer is representative of an X-ray energy within a relatively narrow range of such energies. A second single channel analyzer is also connected to receive the signals from the detector and to pass to an associated second counter a count signal whenever the signal applied to the second analyzer is representative of an X-ray energy falling within a much broader range of such energies than the first mentioned range. The first and second counters accumulate the count signals applied thereto. The count in the second counter is compared by a comparator with a pre-established count in a third counter and when the count in the second counter assumes the same value as the count in the third counter the counts in the first and second counters are held. The so held count in the first counter…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.