Photosensitive compositions
US4477553A · kind A · utility
34Cited by
5References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 29, 1983 |
| Grant date | Oct 16, 1984 |
| Priority date | — |
| Expiry date | Dec 29, 2003 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08K5/28
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
There is disclosed a photosensitive composition comprising an o-quinonediazide compound and, as a binder resin, a resin containing in the molecule the unit represented by the following formula ##STR1## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 have the same meanings as defined in the specification. The photosensitive composition according to the present invention has excellent resistance to chemicals and long press-life, and is excellent in alkali-solubility and difficult to form scumming.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.