Anode for magnetic sputtering apparatus
US4478702A · kind A · utility
14Cited by
4References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 17, 1984 |
| Grant date | Oct 23, 1984 |
| Priority date | — |
| Expiry date | Jan 17, 2004 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3408
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An improved anode system for producing uniform coatings by magnetic sputtering is disclosed, comprising a pair of anode plates symmetrically designed and positioned along the length of the cathode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.