Photolabile blocked surfactants and compositions containing the same
US4478967A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 11, 1980 |
| Grant date | Oct 23, 1984 |
| Priority date | — |
| Expiry date | Aug 11, 2000 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S522/904
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Surfactants which are blocked against surfactant action (identified herein as "photolabile blocked surfactants") by a photolabile protective or masking group but which, on exposure to actinic radiation, become unblocked are provided. Coating compositions in which surfactant is formed on irradiation are provided by blending the photolabile blocked surfactant with polymeric film-forming materials. Compositions containing the photolabile blocked surfactants are useful when employed as protective coatings on various substrates or as the adhesive in a pressure sensitive adhesive tape. Although initially well adhering to a substrate, such compositions may be readily removed from the substrate following exposure of the same to suitable radiation which unblocks the surfactant to permit it to regain its surfactant activity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.