Photographic exposure masks
US4479713A · kind A · utility
4Cited by
8References
9Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Apr 27, 1983 |
| Grant date | Oct 30, 1984 |
| Priority date | — |
| Expiry date | Apr 27, 2003 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03B27/587
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure mask for photographic material has a measuring wheel and two adjustable mask blades. Movement of the photographic material causes rotation of the wheel, which causes a switching member to rotate. Whenever the switching member reaches a given position it operates a switch and stops the transport of the material. Adjustment of one mask blade adjusts the rate of rotation of the switching member relative to that of the measuring wheel by adjusting the axial position of a frustoconical roller that rests on the measuring wheel and drives the switching member.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.