Galvanic dispersion deposition bath
US4479855A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 23, 1984 |
| Grant date | Oct 30, 1984 |
| Priority date | — |
| Expiry date | Mar 23, 2004 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC25D15/02
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A bath or electrolyte for the galvanic deposition of a metal matrix layer having embedded therein particles of a non-metallic substance, comprises a stabilizer for keeping such non-metallic substances uniformly suspended in the bath for the duration of the electrolysis. The suspension stabilizer is a cation active imidazole derivative satisfying the general formula ##STR1## wherein R.sup.1 is preferably a monovalent, saturated or unsaturated hydrocarbon radical having at least four aliphatically bound C-atoms, R.sup.2 is a methylene (carbene), or ethylene, or propylene or isopropylene group, and wherein X is selected from --NH.sub.2, --NHR.sup.3, --NR.sup.3 R.sup.4, --OH, or OR.sup.5, whereby R.sup.3, R.sup.4 and R.sup.5 are methyl, ethyl, or propyl or polyglycolether radicals having up to five --O--CH.sub.2 --CH.sub.2 groups.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.