Pattern forming apparatus
US4480910A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 15, 1982 |
| Grant date | Nov 6, 1984 |
| Priority date | — |
| Expiry date | Mar 15, 2002 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
There is disclosed a pattern forming apparatus for projecting a pattern which is formed on a reticle upon a photoresist layer on a substrate which comprises an illumination system for illuminating the pattern for forming an optical image, a reduction lenses for reducing the optical pattern image at a certain reduction ratio and projecting the reduced optical pattern image upon the photoresist layer formed on the substrate for exposing the photoresist layer, and liquid sustaining means for filling a gap between at least a portion of the reduction lenses and the photoresist layer with an optically transparent liquid having a refractive index of more than 1 (one).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.