Exposure system and method using an electron beam
US4484077A · kind A · utility
1Cited by
2References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 6, 1981 |
| Grant date | Nov 20, 1984 |
| Priority date | — |
| Expiry date | Feb 6, 2001 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3026
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An exposure system or apparatus and method using an electron beam for forming a pattern on a subject, which uses a figure Q which surrounds a pattern P and which is more simplified than the pattern P. Data related to the positions of the vertical and horizontal electron beam used to expose the pattern are stored in a pattern package memory based upon the surrounding figure. The data related to the positions of the electron beam, data related to the start-points of the surrounding figure, and signals based upon the scanning data are supplied to a deflection device of an electron beam device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.