Polishing plate and method for polishing surfaces
US4490948A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 6, 1982 |
| Grant date | Jan 1, 1985 |
| Priority date | — |
| Expiry date | Jul 6, 2002 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24D13/18
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A polishing plate for polishing the surface of synthetic resins has a rigid disk and a compressible cover abutting a lower surface of the rigid disk. The rigid disk has an inlet opening formed centrally therein and a plurality of channels formed in the lower surface thereof. The cover has a plurality of layers including an upper layer of soft foam adjacent the lower surface of the rigid disk, a lower layer having a textile surface structure and which contacts a surface to be polished, and a middle layer which is permeable to liquid and interposed between the upper and lower layers. A method of polishing a surface has as its first step supplying a polishing agent to a central opening formed in a rigid disk. The polishing agent is then uniformly distributed to an upper portion of a cover which is adjacent a lower surface of the disk through a plurality of channels formed in the lower surface of the disk, the channels communicating with the central opening to allow the polishing agent to flow therethrough. Next, the polishing agent is supplied to a lower portion of the cover through a plurality of access openings formed in the cover and disposed below the channels. The polishing agent…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.