Water soluble photoresist composition with bisazide, diazo, polymer and silane
US4491629A · kind A · utility
11Cited by
7References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 18, 1983 |
| Grant date | Jan 1, 1985 |
| Priority date | — |
| Expiry date | Feb 18, 2003 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0085
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Photoresist compositions based upon a water-soluble polymer are disclosed together with a water-soluble bisazide compound as a cross-linker, a water-soluble adhesion-improving diazo compound are characterized in that a water-soluble silane compound is included. The compositions are photosensitive, particularly to ultraviolet rays, and adhere well to the substrates to which they are applied. The compositions of the invention are used as photoresists.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.