Process for activating substrate surfaces for currentless metallization
US4493861A · kind A · utility
23Cited by
6References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 13, 1982 |
| Grant date | Jan 15, 1985 |
| Priority date | — |
| Expiry date | Dec 13, 2002 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C18/28
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A simple and mild method of activating substrate surfaces for currentless metallization involves activating by means of organometallic compounds of elements of the 1st and 8th sub-Groups of the Periodic Table of Elements in which the organic moiety consists of oligomeric, prepolymeric or polymeric compounds containing double bonds.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.