Method for the production of a self-supporting mask
US4497884A · kind A · utility
6Cited by
1References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 22, 1982 |
| Grant date | Feb 5, 1985 |
| Priority date | — |
| Expiry date | Sep 22, 2002 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J9/14
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The invention relates to a method for the production of a self-supporting spacing mask for a particle radiation-projection system, especially for the selective structuring and/or doping when producing highly integrated circuits. According to the invention, layers of varying compositions are deposited onto a substrate, structured and then partially or completely removed, until the mask structure which is backed by a stable metal grid is produced on the substrate, whereby a special pattern, made like a nuclear filter with statistically distributed pores is used for grid formation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.