Installation for treatment of materials for the production of semi-conductors
US4498416A · kind A · utility
59Cited by
4References
1Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 2, 1983 |
| Grant date | Feb 12, 1985 |
| Priority date | — |
| Expiry date | Nov 2, 2003 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/139
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Installation for treatment of materials for semi-conductors, starting from slices (30) gathered onto carriers (5) and treated in a series of vacuum chambers. The installation is in modular form, each module (A, B, C, D) including a straight tubular portion (1, 2, 3, 4) which forms with the adjacent modules a continuous tunnel for straight flow of the carriers (5). The carriers are driven and the slices are individually manipulated between the carriers and the treatment apparatus. The invention is applicable to treatment by epitaxis by molecular jets.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.