Method for forming pattern and photoresist used therein
US4501806A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 1, 1982 |
| Grant date | Feb 26, 1985 |
| Priority date | — |
| Expiry date | Sep 1, 2002 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/095
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method for forming a pattern of a non-light-emitting black material on the inner surface of a faceplate of a color cathode ray tube is provided, which comprises the steps of: PA0 forming a photoresist layer of a photoresist containing a water-soluble bisazidocompound, a water-soluble diazocompound, and a water-soluble polymeric material, on an inner surface of a faceplate of a color cathode ray tube; PA0 selectively exposing parts of the photoresist layer using a shadow mask so as to photocure the exposed parts; PA0 developing the photoresist layer to remove unexposed parts of the photoresist layer, thereby forming dots of the photoresist; PA0 forming a film of a non-light-emitting black material on the inner surface of the faceplate including the dots; and PA0 removing the dots and the non-light-emitting black material on the dots so as to form holes in the film of the non-light-emitting black material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.