Laser beam plasma pinch X-ray system
US4504964A · kind A · utility
81Cited by
6References
20Claims
0Family size
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Key dates
| Filing date | Sep 20, 1982 |
| Grant date | Mar 12, 1985 |
| Priority date | — |
| Expiry date | Sep 20, 2002 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E30/10
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A system is provided for producing plasma pinch X-rays usable in X-ray lithography. Ionized heated plasma vapor is repeatably generated directly from solid material by impingement of a plurality of circumferentially spaced laser beams to generate an annulus of plasma. X-rays are generated by passing high current through the annular plasma in an axial gap between the solid material target electrode and another electrode, causing magnetic field radial inward plasma pinching to a central constricted area further heating the plasma and emitting X-rays. A central axially directed laser may further heat the plasma in the pinched area.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.