Photomask with corrected white defects
US4510222A · kind A · utility
30Cited by
4References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 19, 1983 |
| Grant date | Apr 9, 1985 |
| Priority date | — |
| Expiry date | May 19, 2003 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/146
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photomask with white defects that have corrected with a film comprising a mixture of silver and tantalum oxide. The film has a good resistance to chemicals.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.