Procedure for fabrication of microstructures over large areas using physical replication
US4512848A · kind A · utility
143Cited by
2References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 6, 1984 |
| Grant date | Apr 23, 1985 |
| Priority date | — |
| Expiry date | Feb 6, 2004 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/50
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention is an improved replication process which copies a master pattern onto an intermediate transfer mask which is then used to form a lithographic mask on the surface of a substrate. A pattern derived from the original master pattern is then produced in the substrate by an etching process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.