Silicon oxide lapping coatings
US4514192A · kind A · utility
3Cited by
11References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 27, 1982 |
| Grant date | Apr 30, 1985 |
| Priority date | — |
| Expiry date | Jul 27, 2002 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24D3/34
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
Enhanced micromachining rates are observed when lapping discs with standard SiO.sub.x lapping coatings are doped with trivalent or pentavalent additives, such as boron or phosphorous. Doping can be accomplished by subjecting the SiO.sub.x material to a "post glow", i.e., an argon plasma in the presence of a source of the dopant.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.