Apparatus for physical vapor deposition
US4514275A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 30, 1984 |
| Grant date | Apr 30, 1985 |
| Priority date | — |
| Expiry date | Mar 30, 2004 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/04
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus for physical vapor deposition comprising a vacuum casing one end of which is open; a sealing member provided at the opening of the casing; an electrode for physical vapor deposition, such as a target electrode or an electrode for heating evaporation, which is provided in the casing; and an exhaust hole for exhausting gases in the casing, which is provided at a predetermined wall portion of the casing. The apparatus may also be provided with a gas introducing hole and a bias electrode. The casing is integrally fitted to a body to be treated at the opening end portion thereof by means of the sealing member to form a vacuum chamber therein. This apparatus is compact and enables the surface treatment of a large or immovable body without moving the body.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.