Optical absorption enhancement in amorphous silicon deposited on rough substrate
US4514582A · kind A · utility
58Cited by
4References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 2, 1984 |
| Grant date | Apr 30, 1985 |
| Priority date | — |
| Expiry date | Mar 2, 2004 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/964
Abstract
A thin film semiconductor device with enhanced optical absorption properties and a method for producing it. The device comprises a substrate having at least one sandblasted surface and a thin film of semiconductor material deposited on the sandblasted surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.