Photopatternable dielectric compositions, method for making and use
US4515887A · kind A · utility
14Cited by
3References
4Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Aug 29, 1983 |
| Grant date | May 7, 1985 |
| Priority date | — |
| Expiry date | Aug 29, 2003 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S522/905
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
There is provided a photosensitive modified silicone-aromatic polyamide acid convertible to a patterned silicone-polyimide. A silicone-polyamide acid is modified with an isocyanatoalkylacrylate to produce a silicone-aromatic polyamide acid having acrylate alkylamide groups attached to the silicone-aromatic polyamide acid backbone by nitrogen-nuclear bound carbon linkages.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.