Cryoelectrodeposition
US4517253A · kind A · utility
15Cited by
6References
51Claims
0Family size
Inventors
Key dates
| Filing date | Jan 23, 1984 |
| Grant date | May 14, 1985 |
| Priority date | — |
| Expiry date | Jan 23, 2004 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/12972
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A process for electrodeposition of a material on a substrate that includes the steps of establishing a liquid halogenous electrolyte containing the material to be plated on the substrate and a solute, said electrolyte having an appropriate electrical conductance in a cryogenic environment; and establishing an electric field within the electrolyte to effect migration of ions of said material to the substrate where they deposit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.