Dual level pattern recognition system
US4521909A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Oct 4, 1983 |
| Grant date | Jun 4, 1985 |
| Priority date | — |
| Expiry date | Oct 4, 2003 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06V30/2504
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A pattern recognition system has both coarse and fine levels of analysis in which a coarse array representation of a workpiece pattern is formed and used to identify the workpiece pattern as either a referench character or as a member of an ambiguous set of reference characters which are represented by identical coarse array representations. At least portions of a fine array representation of a workpiece pattern which has been classified as a member of a set of reference characters are compared to corresponding portions of fine array representations of reference characters in the set identified by the classification. The pattern recognition system has a learning system through which reference characters may be introduced into the recognition system and through which a representation of a workpiece pattern which was not identified may be incorporated into an existing set of reference characters of the recognition system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.