Reactor and susceptor for chemical vapor deposition process
US4522149A · kind A · utility
50Cited by
3References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 21, 1983 |
| Grant date | Jun 11, 1985 |
| Priority date | — |
| Expiry date | Nov 21, 2003 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/458
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A reactor for use in a chemical vapor deposition process occurring in a radiant absorption heater system employs a vertical gas flow reaction vessel and a novel substantially solid susceptor configured as a truncated wedge. The susceptor is characterized by a high utilized area, resulting in a high wafer capacity and low power requirement.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.