Liquid crystal light valve structures
US4522469A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jan 9, 1984 |
| Grant date | Jun 11, 1985 |
| Priority date | — |
| Expiry date | Jan 9, 2004 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S428/913
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An improved photosensor film and liquid crystal light valves embodying said film is provided. The photosensor film and liquid crystal light valve is characterized by a significant lower image retention time while maintaining acceptable photosensitivity. The photosensor film is produced by sputter depositing CdS onto an ITO substrate in an atmosphere of aqrgon/H.sub.2 S gas while maintaining the substrate at a temperature in the range of about 130.degree. C. to about 200.degree. C. and while introducing nitrogen gas into the system to the extent of not more than about 1% of plasma mixture. Following sputter deposition of the CdS, the film is annealed in an inert gas at temperatures ranging from about 300.degree. C. to about 425.degree. C.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.