Copolymers, process for the preparation thereof and ionizing radiation sensitive resist using such copolymers
US4523000A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 28, 1983 |
| Grant date | Jun 11, 1985 |
| Priority date | — |
| Expiry date | Oct 28, 2003 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/033
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Solvent-soluble copolymers having a number average molecular weight of about 1,000 to about 1,000,000 and comprising recurring units of the following formulae (I) and (II) (case A) or recurring unit of the following formulae (I), (II) and (III) (case B) or solvent-soluble graft copolymers having a number average molecular weight of about 1,500 to about 2,000,000 and comprising recurring units of the following formulae (I), (II) and/or (II'), and (IV) (case C) or recurring units of the following formulae (I), (II) and/or (II'), (III) and (IV) (case D), said recurring units being ##STR1## wherein each of R.sub.1, R.sub.2 and R.sub.3 represents independently hydrogen, a straight or branched chain alkyl group having 1 to 4 carbon atoms or a halogen; R.sub.4 represents hydrogen or a straight or branched chain alkyl group having 1 to 10 carbon atoms; R.sub.5 represents an alkyl group having 1 to 6 carbon atoms, a phenyl group or a benzyl group; R.sub.6 represents hydrogen or a methyl group; R.sub.7 represents a straight or branched chain alkyl group having 1 to 10 carbon atoms, an aryl group, an aralkyl group or an aminoalkyl group; and n is an integer of 1 to 50. A resist having an exce…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.