Patent · US Expired

Scanning optical system subjected to a moisture proof treatment

US4523801A · kind A · utility

17Cited by
5References
5Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 24, 1982
Grant dateJun 18, 1985
Priority date
Expiry dateFeb 24, 2002

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02B3/00
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

An optical system for scanning a medium with a beam spot includes a light beam generator, a deflector for deflecting the light beam in a predetermined direction and in deflection plane, and an imaging optical system between the deflector and the medium for imaging the light beam from the deflector on the medium as a beam spot, the imaging optical system having at least one lens element mode of a moisture absorbing material. The lens element has a shape in which the dimension in a direction parallel to the deflection plane of the light beam is greater than the dimension in a direction perpendicular to the deflection plane of the light beam. A device mitigates any influence on the imaged condition of the light beam on the medium caused by the lens element being subjected to moisture.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.