Positive photoresists containing preformed polyglutarimide polymer
US4524121A · kind A · utility
49Cited by
6References
30Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 21, 1983 |
| Grant date | Jun 18, 1985 |
| Priority date | — |
| Expiry date | Nov 21, 2003 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/094
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
This invention relates to a positive photoresist system possessing a high degree of thermal stability. The photoresist system contains a preformed polyglutarimide polymer dissolved in a non-reacting solvent. The positive resist is capable of achieving high resolution images by exposure to a wide range of wavelengths and development using an aqueous base developer. The photoresist system is also suitable for use as a planarizing layer in a multiple layer system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.