Patent · US Expired

Electron beam strip-coating apparatus

US4524717A · kind A · utility

5Cited by

6References

10Claims

0Family size

Assignee

Bakish Materials Corporation · US

Inventors

Manfred Neumann · Marl, DE
Siegfried Schiller · Dresden, DE
Gerhard ZeiBig · Dresden, DE
Henry Morgner · Dresden, DE
Gunter Jasch · Dresden, DE

Key dates

Filing date	Apr 18, 1983
Grant date	Jun 25, 1985
Priority date	—
Expiry date	Apr 18, 2003

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/3053
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

The present invention is a coating apparatus for temperature-sensitive broad strips or similar substrates. To obtain a high quality of coating, it is necessary to minimize the path of the electron beam (EB) through the vapor cloud, and to keep away backscattered electrons from the evaporating material. According to the invention, this problem is solved by assembling a sector field with a vertical field direction at the deflection system connected with the EB gun, which is followed by a deflection field with a horizontal field direction. The divergent electron beam is guided in lines to the evaporating material by the geometry of the fields.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.