Exposure control system for photographic camera apparatus
US4527888A · kind A · utility
0Cited by
6References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 23, 1984 |
| Grant date | Jul 9, 1985 |
| Priority date | — |
| Expiry date | Jan 23, 2004 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03B7/087
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure control system for a photographic camera apparatus includes a single latch mechanism for latching a shutter blade mechanism of the type which is resiliently biased to move toward its scene light admitting position from its scene light blocking position between photographic exposure cycles and for latching an automatically focused lens arrangement at its appropriate focal position during a photographic exposure cycle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.