Wafer handling apparatus and method
US4529353A · kind A · utility
34Cited by
5References
2Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 27, 1983 |
| Grant date | Jul 16, 1985 |
| Priority date | — |
| Expiry date | Jan 27, 2003 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/141
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Compact apparatus characterized by cleanliness of operation, high throughput and low cost is designed for automatically loading and unloading wafer-carrying trays that are designed to be mounted in the reaction chamber of a processing system. A key component of the apparatus comprises a unique wafer vacuum chuck.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.