Patent · US Expired

Method for producing a thin film resistor

US4530852A · kind A · utility

1Cited by

5References

9Claims

0Family size

Assignee

Brown, Boveri & Cie AG · DE

Inventors

Hermann Birnbreier · Sandhausen, DE
Helmut Haas · Achim, DE

Key dates

Filing date	Jan 16, 1984
Grant date	Jul 23, 1985
Priority date	—
Expiry date	Jan 16, 2004

Classification

Technology area (CPC H)Electricity
CPC primaryH01C17/265
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

Method for producing a thin film resistor by vapor deposition or cathode sputtering techniques, wherein part of the resistance area of the film is covered by an electrically insulating layer which prevents oxygen diffusion onto the resistance material and causes a decrease of the resistance during aging, while the rest of the resistance area remains free.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.