Process for producing conductors for integrated circuits using planar technology
US4533431A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jan 13, 1984 |
| Grant date | Aug 6, 1985 |
| Priority date | — |
| Expiry date | Jan 13, 2004 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K3/107
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
The invention relates to a process for producing conductors for integrated circuits using planar technology. According to this process, on a substrate is deposited an insulating material coating. A masking sheet is deposited on the insulating material coating and this sheet is cut to form windows corresponding to the conductors to be obtained. The insulating material sheet is etched facing the windows. A conductive material is deposited on the cut masking sheet. The masking sheet and the conductive material covering it are removed. This process consists of choosing a masking sheet having a first coating covering the insulating material coating and a second masking coating covering the first coating. The first coating is cut chemically facing the windows and after cutting the second masking coating, the edges of the first coating on the periphery of the windows are eroded by chemical cutting. Application to the production of planar integrated circuits.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.