Process for fabricating cryogenic targets and targets made thereby
US4535023A · kind A · utility
8Cited by
2References
19Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 3, 1983 |
| Grant date | Aug 13, 1985 |
| Priority date | — |
| Expiry date | Jun 3, 2003 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24802
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A process for patterning a target for lasing at X-ray wavelengths from materials which cannot be readily shaped. A substrate of one material is placed in a gaseous atmosphere of another material, and the substrate is cooled below the freezing point of the other material so that a frozen layer of the other material condenses onto the substrate. Part of the frozen layer of the other material is masked, and the unmasked part of the frozen layer is vaporized so that the substrate of the one material is coated with the other material according to the pattern of the mask. The target made by the process is also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.