Patent · US Expired

Constrained n-alkylamino aryl ketones as sensitizers for photopolymer compositions

US4535052A · kind A · utility

27Cited by

11References

10Claims

0Family size

Assignee

E.I. DU PONT DE NEMOURS AND COMPANY · US

Inventors

Albert G. Anderson · Wilmington, US
Thomas E. Dueber · Wilmington, US

Key dates

Filing date	Aug 28, 1984
Grant date	Aug 13, 1985
Priority date	—
Expiry date	Aug 28, 2004

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S430/126
WIPO fieldMacromolecular chemistry, polymers
WIPO sectorChemistry

Abstract

Photopolymerizable compositions comprising PA1 (a) at least one ethylenically unsaturated compound, PA1 (b) at least one organic polymeric binder, PA1 (c) optionally at least one photoinitiator and PA1 (d) at least one constrained N-alkylamino aryl ketone compound as defined, e.g., bis(9-julolidyl ketone), bis-(N-ethyl-1,2,3,4-tetrahydro-6-quinolyl)ketone, etc. The compositions, in layer form, are useful in photoresists, including projection speed photoresists, printing plates, drafting and toning films, etc.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.