Production of silicon carbide
US4536379A · kind A · utility
9Cited by
13References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 2, 1983 |
| Grant date | Aug 20, 1985 |
| Priority date | — |
| Expiry date | Jun 2, 2003 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01P2006/80
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A process for the manufacture of silicon carbide crystals and whiskers comprises reacting at a temperature between 1,400.degree. C. and 2,100.degree. C. and in the presence of an inert gas, a material including as essential ingredients carbon, alumina, iron oxide, potassium oxide, and silica in an amount to provide a carbon to silicon ratio of from about 0.84:1 to about 2.17:1.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.