Patent · US Expired

Device for the projection printing of masks into a workpiece

US4540277A · kind A · utility

85Cited by

2References

7Claims

0Family size

Assignee

Perkin-Elmer Censor Anstalt · LI

Inventors

Herbert E. Mayer · Abensberg, DE
Ernst Lobach · Eschen, LI

Key dates

Filing date	Jun 24, 1983
Grant date	Sep 10, 1985
Priority date	—
Expiry date	Jun 24, 2003

Classification

Technology area (CPC G)Physics
CPC primaryG03F9/70
WIPO fieldOptics
WIPO sectorInstruments

Abstract

In order to determine magnification and/or alignment in a device for the projection printing of a pattern on a mask onto a substrate an adjustment plate insertable below the projection lens is provided, said adjustment plate being provided with light-transmitting zones conjugated with recesses in the mask in respect of the projection lens in the exposure light, photometer means being arranged below said light-transmitting zones.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.