Storage-stable photosensitive composition and article with adduct of diazo resin and amorphous sulfopolyester
US4543315A · kind A · utility
5Cited by
7References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 30, 1983 |
| Grant date | Sep 24, 1985 |
| Priority date | — |
| Expiry date | Sep 30, 2003 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/021
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A presensitized article having a radiation-sensitive layer comprising an adduct of an amorphous sulfopolyester and a diazonium resin is described which does not exhibit blocking on being stored in stacks for prolonged periods of time. The article can be exposed to radiation and developed via aqueous solvents to provide a lithographic plate that provides clean, scum-free copies, and that can be stored in a high humidity atmosphere without failure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.