Patent · US Expired

Pattern features extracting apparatus and method

US4543660A · kind A · utility

34Cited by
4References
11Claims
0Family size

Assignee

Inventor

Key dates

Filing dateApr 14, 1983
Grant dateSep 24, 1985
Priority date
Expiry dateApr 14, 2003

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG06V10/75
  • WIPO fieldComputer technology
  • WIPO sectorElectrical engineering

Abstract

A plurality of different mask pattern data which are indicated by values obtained from Hermitte's polynomials of different degrees weighted by a Gaussian function are stored in mask memories, respectively. Each mask pattern data stored in each of the mask memories is convolved by a sum-of-product circuit together with unknown input pattern data. A plurality of extracted pattern feature data are stored in pattern feature memories.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.