Method for manufacturing an optical memory element
US4544443A · kind A · utility
53Cited by
6References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 3, 1984 |
| Grant date | Oct 1, 1985 |
| Priority date | — |
| Expiry date | May 3, 2004 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B11/10582
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
An optical memory element includes stripe-shaped grooves formed directly on a glass substrate. To manufacture the optical memory element, a resist film is disposed on the glass substrate, and a groove pattern is formed in the resist film. A reactive ion etching is conducted through the groove pattern formed in the resist film so as to form the guide grooves in the glass substrate. After removing the resist film from the glass substrate, a magneto-optical recording layer is formed on the glass substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.