Electrochemical photocatalytic structure
US4544470A · kind A · utility
86Cited by
1References
7Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | May 31, 1984 |
| Grant date | Oct 1, 1985 |
| Priority date | — |
| Expiry date | May 31, 2004 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S204/03
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A planar photoelectrochemical structure includes a thin, porous layer of semiconductor powder material on a catalytic film. Using incident light absorbed by the semiconductor, the structure is suited to photosensitizing redox reactions of substrates introduced to the structure in an aqueous gas-phase environment. Conducting catalyst films allow significant external electrical interaction with the photoelectrochemical process occurring in the layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.