Positive-working photoresist composition and method for forming a light-absorbing matrix
US4546064A · kind A · utility
1Cited by
9References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 4, 1983 |
| Grant date | Oct 8, 1985 |
| Priority date | — |
| Expiry date | Nov 4, 2003 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/11
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A positive-working photoresist composition is described comprising a solution of polyvinyl alcohol, an inorganic ferric salt, ammonium trioxalatoferrate and a diol such as 1,4-butanediol. There is also described the addition of a finely divided black pigment to such a composition and the use of such a black pigmented composition for the formation of a light-absorbing matrix in a color CRT screen structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.